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HJT反應式等離子體鍍膜設備

設備名稱 Equipment Name

HJT反應式等離子體鍍膜設備  Reactive Plasma Deposition (RPD)


設備型號 Equipment Model

RPD5500A


設備優勢 Advantages

高解離率離子、低轟擊能量鍍膜,不損傷襯底表面,保持良好的接口特性,薄膜的載子遷移率超高,經長期量產驗證的精密鍍膜技術。

High dissociation rate coating mechanism with almost no ion bombardment to maintain good interface characteristics where high carrier mobility can be reached in this reliable coating technology.


設備用途 Equipment Usage

制備透明導電薄膜。

Transparent Conductive Layer (TCO) coating.

設備工藝 Process

使用低能量高密度電子束升華靶材產生高解離率的離子鍍著在襯底的表面

High free state target ions sublimated by low energy electron beam recombine on the substrate to form a high quality film


技術特點  Features

1、世界第一異質結太陽電池大廠唯一選用RPD設備。
The world top one heterojunction solar cell manufacturer only chooses RPD equipment.

2、高達80%以上銦解離率,成就高質量的透明導電膜(TCO)。
Up to 80% indium dissociation rate, achieving high quality transparent conductive film.

3、鍍膜過程低于30eV離子轟擊,不損傷非晶硅膜,保持良好接口特性。
The coating process is less than 30eV ion bombardment, does not damage the amorphous silicon film, and maintains good interface characteristics.

4、高載子遷移率與低載子濃度,確保優異導電性與高長波長透光率。
High carrier mobility and low carrier concentration ensure excellent conductivity and high long-wavelength transmittance.

5、靶材IWO載子遷移率高達80cm2/V·s,新材料ICO載子遷移率可高達130cm2/V·s。
IWO carrier mobility up to 80cm2/V.s, where ICO carrier mobility can be as high as 130cm2/V.s.

6、異質結廠商長期量產驗證,采用RPD制備的電池效率比其他設備多0.4%。
Long-term mass production verification of HJT cell manufacturers, the conversion efficiency of HJT solar cell manufactured by RPD is 0.4% more than made by other equipment.

7、可依客戶產線規劃,提供直線型RPD設備與回路型RPD設備。

Linear type and loop type RPD equipment can be provided according to customer request.   


設備參數  Parameters



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